Secondary Ion Mass Spectrometry
Secondary Ion Mass Spectrometer (SIMS), used for for surface molecular or elemental analysis, trace element depth profiling, and secondary ion microscopy. This instrument provides true elemental and stable isotopic analysis with high mass resolution and high sensitivity (parts per billion detection limits). The ion probe is optimized for rare earth elements and stable isotopes (H, C, N, O, S) analysis of natural and synthetic materials. It can be used to provide a 3-dimensional chemical analysis profile from a surface into the bulk of a solid with sub-micron spatial resolution.
Secondary ion mass spectrometry (SIMS) offers elemental depth profile by sputtering the surface of the specimen with a beam of primary ions; the ejected secondary ions are collected and analyzed using a mass spectrometer, providing elemental, isotopic or molecular composition over a wide depth range from a few angstroms to tens of micrometers. With its ppm-ppb detection sensitivity, SIMS is commonly used to detect very low concentrations of impurities and dopants.
APPLICATIONS
- Dopant and impurity measurements with ppm-ppb detection sensitivity
- Compositional analysis of thin films with ultra-high depth resolution
- Detection of all elements and isotopes
LIMITATIONS
- Vacuum compatibility required
- Destructive technique
- Chemical bonding information unavailable