Focused Ion Beam

APPLICATIONS

Dual beam FIB-SEM is a workstation that combines a scanning electron microscope (SEM) and a focused ion beam (FIB); it is heavily used in semiconductor industry, materials science, and increasingly in geoscience and biological field for site-specific analysis. SEM delivers high resolution images, while FIB is mostly used to add and subtract micro volumes of material in a controlled manner, like a nanomachining device. Coupled to an Energy Dispersive X-ray Spectroscopy (EDS) detector and Electron Backscattered diffraction (EBSD) camera, dual beam FIB-SEM provides elemental identification and crystallographic properties from the cross-section of the sample. With serial slicing technique, structural, chemical and crystallographic information can be revealed in three dimensions.  

• High resolution cross-section images
• Site-specific liftout preparation for TEM analysis
• Grain contrast imaging
• Circuit modification
• Serial slicing and 3D reconstruction

LIMITATIONS

• Vacuum compatibility required
• Sample size restriction
• Ion implantation
• Ion beam damage